C. Leroux

Characterization and modeling of hysteresis phenomena in high K dielectrics

C. Leroux, Jérôme Mitard, G. Ghibaud et al. · 2005 · 107 citations

Engineering, Electrical Engineering, Materials Engineering +17

75 nm damascene metal gate and high-k integration for advanced CMOS devices

B. Guillaumot, X. Garros, F. Lime et al. · 2003 · 69 citations

Engineering, Electrical Engineering, Electronic Materials +15

Frequency characterization and modeling of interface traps in HfSixOy/HfO2 gate dielectric stack from a capacitance point-of-view

Pascal Le Masson, Jean‐Luc Autran, Michel Houssa et al. · Applied Physics Letters · 2002 · 66 citations

Engineering, Electrical Engineering, Materials Science +17

Metal/Acid Bifunctional Catalysis and Intimacy Criterion for Ethylcyclohexane Hydroconversion: When Proximity Does Not Matter

Esther Gutiérrez-Acebo, C. Leroux, Céline Chizallet et al. · ACS Catalysis · 2018 · 61 citations · Full text

Natural Sciences, Chemical Engineering, Chemistry +17

Electrical and physico-chemical characterization of HfO2/SiO2 gate oxide stacks prepared by atomic layer deposition

J.-F. Damlencourt, O. Renault, D. Samour et al. · Solid-State Electronics · 2003 · 46 citations

Engineering, Materials Engineering, Materials Science +16