C. Leroux

Characterization and modeling of hysteresis phenomena in high K dielectrics

C. Leroux, Jérôme Mitard, G. Ghibaud et al. · 2005 · 107 citations

Electrical Engineering, Dielectrics, Engineering +12

75 nm damascene metal gate and high-k integration for advanced CMOS devices

B. Guillaumot, X. Garros, F. Lime et al. · 2003 · 69 citations

Low-power Electronics, Electrical Engineering, Low Ioff +14

Frequency characterization and modeling of interface traps in HfSixOy/HfO2 gate dielectric stack from a capacitance point-of-view

Pascal Le Masson, Jean‐Luc Autran, Michel Houssa et al. · Applied Physics Letters · 2002 · 66 citations

Device Modeling, Semiconductors, Electrical Engineering +15

Metal/Acid Bifunctional Catalysis and Intimacy Criterion for Ethylcyclohexane Hydroconversion: When Proximity Does Not Matter

Esther Gutiérrez-Acebo, C. Leroux, Céline Chizallet et al. · ACS Catalysis · 2018 · 60 citations · Full text

Engineering, Ethylcyclohexane Hydroconversion, Organic Chemistry +18

Electrical and physico-chemical characterization of HfO2/SiO2 gate oxide stacks prepared by atomic layer deposition

J.-F. Damlencourt, O. Renault, D. Samour et al. · Solid-State Electronics · 2003 · 46 citations

Materials Science, Physico-chemical Characterization, Engineering +10