Characterization and modeling of hysteresis phenomena in high K dielectrics

Abstract

An original technique for the dynamic analysis of Id(Vg) hysteresis on high K stacks is proposed, allowing the characterization of Vt shift transients at short times. The experimental results demonstrate that trapping/de-trapping mechanism by tunneling from the substrate must be considered. Furthermore, a new model based on a trap-like approach is successfully developed to interpret the dependence of hysteresis phenomena with high k gate stack architecture.