Erik Verduijn

BEOL process integration for the 7 nm technology node

T. Standaert, Genevieve Beique, H.-C. Chen et al. · 2016 · 35 citations

Engineering, Electron-beam Lithography, Device Integration +17

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 25 citations

Engineering, Electron-beam Lithography, Euv Patterning Successes +18

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Obert R. Wood, Sudharshanan Raghunathan, Pawitter J. S. Mangat et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 24 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Imaging impact of multilayer tuning in EUV masks, experimental validation

Vicky Philipsen, Eric Hendrickx, Erik Verduijn et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 23 citations

Pattern Shift, Mask 3D, Engineering +15

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Sudharshanan Raghunathan, Obert R. Wood, Pawitter J. S. Mangat et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2014 · 20 citations

Engineering, Microscopy, Optic Design +18