Concepedia

Author

Erik Verduijn

GlobalFoundries (United States)

Also Known As

E. Verduijn, Erik A. Verduijn, Erik Verduijn

29

Publications

259

Citations

9

H-Index

35

Concepts

All Affiliations

GlobalFoundries (United States)IMECLawrence Berkeley National LaboratoryPhysikalisch-Technische BundesanstaltIBM (United States)
EV

About

Erik Verduijn is an author at GlobalFoundries (United States) specializing in engineering, microfabrication, and microelectronics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

8

8

174

2

Applied Physics

4

4

94

3

Computer Engineering

4

4

100

4

Medicine

2

2

35

5

Health Sciences

1

1

23

Erik Verduijn

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9

Publications

189

Citations

9

H-Index

YearCitations

BEOL process integration for the 7 nm technology node

T. Standaert, Genevieve Beique, H.-C. Chen,

2016

35

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2016

25

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Obert R. Wood, Sudharshanan Raghunathan, Pawitter J. S. Mangat,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

24

Imaging impact of multilayer tuning in EUV masks, experimental validation

Vicky Philipsen, Eric Hendrickx, Erik Verduijn,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2014

23

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Sudharshanan Raghunathan, Obert R. Wood, Pawitter J. S. Mangat,

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

2014

20

Comparison of left and right side line edge roughness in lithography

Lei Sun, Nicole Saulnier, Genevieve Beique,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2016

20

Line edge roughness frequency analysis for SAQP process

Lei Sun, Xiaoxiao Zhang, Shimon Levi,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2016

17

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

Pawitter J. S. Mangat, Erik Verduijn, Obert R. Wood,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

15

Deconstructing contact hole CD printing variability in EUV lithography

Deniz Civay, Tom Wallow, Necip Doganaksoy,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2014

10

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