Pawitter J. S. Mangat

Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

G. F. Cardinale, Craig C. Henderson, J. E. M. Goldsmith et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 30 citations

Optical Materials, Engineering, Electron-beam Lithography +20

Considerations for a free-electron laser-based extreme-ultraviolet lithography program

Erik R. Hosler, Obert R. Wood, William A. Barletta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 26 citations

Accelerator Technology, Free-electron Lasers, Electrical Engineering +13

Cr absorber etch process for extreme ultraviolet lithography mask fabrication

K. H. Smith, James R. Wasson, Pawitter J. S. Mangat et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 25 citations · Full text

Engineering, Electron-beam Lithography, Integrated Circuits +16

Layout small-angle rotation and shift for EUV defect mitigation

Hongbo Zhang, Yuelin Du, Martin D. F. Wong et al. · 2012 · 24 citations

Engineering, Electron-beam Lithography, Computer-aided Design +16

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Obert R. Wood, Sudharshanan Raghunathan, Pawitter J. S. Mangat et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 24 citations

Optical Materials, Engineering, Electron-beam Lithography +19