Sudharshanan Raghunathan

Mask 3D effects and compensation for high NA EUV lithography

Sudharshanan Raghunathan, Greg McIntyre, Germain Fenger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 24 citations

Mask 3D, Engineering, Electron-beam Lithography +23

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Obert R. Wood, Sudharshanan Raghunathan, Pawitter J. S. Mangat et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 24 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Sudharshanan Raghunathan, Obert R. Wood, Pawitter J. S. Mangat et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2014 · 20 citations

Engineering, Microscopy, Optic Design +18

Computational scanner wafer mark alignment

Boris Menchtchikov, Robert Socha, Sudharshanan Raghunathan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 16 citations

Extreme ultraviolet lithography resist-based aberration metrology

Germain Fenger, Lei Sun, Sudharshanan Raghunathan et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 11 citations

Engineering, Electron-beam Lithography, Microscopy +17