Greg McIntyre

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Melchior Mulder, André Engelen, O.F.J. Noordman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 50 citations

Engineering, Freeform Sources, Computational Illumination +18

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations

Electrical Engineering, Pixelated Illumination, Engineering +15

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Joost Bekaert, Paolo Di Lorenzo, Ming Mao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 25 citations

Mask 3D effects and compensation for high NA EUV lithography

Sudharshanan Raghunathan, Greg McIntyre, Germain Fenger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 24 citations

Mask 3D, Engineering, Electron-beam Lithography +23

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

Víctor M. Blanco Carballo, Joost Bekaert, Ming Mao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 23 citations

Foundry N5 Equivalent, Engineering, Vlsi Design +19