Boris Menchtchikov

High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Jan Mulkens, Michael Kubis, Paul Hinnen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 23 citations

Engineering, Electron-beam Lithography, Microscopy +19

Computational scanner wafer mark alignment

Boris Menchtchikov, Robert Socha, Sudharshanan Raghunathan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 16 citations

Improving scanner wafer alignment performance by target optimization

Philippe Leray, Christiane Jehoul, Robert Socha et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 12 citations

Holistic feedforward control for the 5 nm logic node and beyond

Henry Megens, Ralph Brinkhof, Igor Aarts et al. · 2019 · 10 citations