Henry Megens

Magneto-optical trapping of metastable xenon: Isotope-shift measurements

M. Walhout, Henry Megens, A. Witte et al. · Physical Review A · 1993 · 70 citations

Engineering, Nuclear Physics, Magnetic Resonance +16

Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Jan Mulkens, M. M. Hanna, Hannah Wei et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 68 citations

Electrical Engineering, Physical Design (Electronics), Engineering +12

Bright thermal atomic beams by laser cooling: A 1400-fold gain in beam flux

M. D. Hoogerland, J. P. J. Driessen, E.J.D. Vredenbregt et al. · Applied Physics B · 1996 · 43 citations

Photonics, Thermal Radiation, Engineering +11

Double patterning for 32nm and below: an update

Jo Finders, Mircea Dusa, Bert Vleeming et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Cdu Control, Physical Design (Electronics), Array Computing +15

Combined overlay, focus and CD metrology for leading edge lithography

Martin Ebert, Hugo Cramer, Wim Tel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Engineering, Electron-beam Lithography, Microscopy +16