Vicky Philipsen

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Andreas Erdmann, Dongbo Xu, Peter Evanschitzky et al. · Advanced Optical Technologies · 2017 · 63 citations · Full text

Optical Materials, Engineering, Electron-beam Lithography +20

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2020 · 42 citations · Full text

Optical Materials, Engineering, Electron-beam Lithography +21

Ni-Al Alloys as Alternative EUV Mask Absorber

Vu Luong, Vicky Philipsen, Eric Hendrickx et al. · Applied Sciences · 2018 · 40 citations · Full text

Short Wavelength Optic, Optical Materials, Mask 3D +17

Actinic characterization and modeling of the EUV mask stack

Vicky Philipsen, Eric Hendrickx, R. Jonckheere et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 36 citations

Optical Materials, Engineering, Optic Design +16

Reducing EUV mask 3D effects by alternative metal absorbers

Vicky Philipsen, Vu Luong, Laurent Souriau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 32 citations

Optical Materials, Engineering, Electron-beam Lithography +17