Hazem Mesilhy

Publications

164

Citations

H-Index

2018

Active since

Affiliations

Fraunhofer Institute for Integrated Systems and Device Technology(Current)

ASML (Netherlands)

IMEC

Carl Zeiss (Germany)

Hazem Mesilhy is an author at Fraunhofer Institute for Integrated Systems and Device Technology specializing in optical properties, engineering, and optical materials.

ORCID

Top concepts

EngineeringOptical PropertiesApplied PhysicsOptical MaterialsMaterial ScienceOptical EngineeringComputational ImagingPhysicsOphthalmologyOptical Systems

Publications per year

2018–2022

Publications

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2020 · 42 citations · Full text

Optical Materials, Engineering, Electron-beam Lithography +21

Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky · Journal of Micro/Nanopatterning Materials and Metrology · 2022 · 24 citations

Study of novel EUVL mask absorber candidates

Meiyi Wu, Devesh Thakare, Jean‐François de Marneffe et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2021 · 23 citations

Mask Patterning, Short Wavelength Optic, Optical Materials +16

Attenuated PSM for EUV: Can they mitigate 3D mask effects?

Andreas Erdmann, Peter Evanschitzky, Vicky Philipsen et al. · 2018 · 21 citations

Attenuated Psm, Engineering, Ophthalmology +10

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 19 citations · Full text

Short Wavelength Optic, Optical Materials, Engineering +16

Rows per page

1–5 of 8