Concepedia

Peter Evanschitzky

PE

Statistics

Publications

41

Citations

832

H-Index

19

Active since

2003

Affiliations

Fraunhofer Institute for Integrated Systems and Device Technology(Current)

IMEC

Schott (Germany)

Carl Zeiss (Germany)

Friedrich-Alexander-Universität Erlangen-Nürnberg

Peter Evanschitzky is an author at Fraunhofer Institute for Integrated Systems and Device Technology specializing in engineering, applied physics, and optical properties.

Top concepts

Publications per year

2003–2022

41

Publications

41

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Andreas Erdmann, Dongbo Xu, Peter Evanschitzky et al. · Advanced Optical Technologies · 2017 · 63 citations · Full text

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Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2020 · 42 citations · Full text

, , +21

Fast near field simulation of optical and EUV masks using the waveguide method

Peter Evanschitzky, Andreas Erdmann · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 38 citations

, , +18

Optical and EUV projection lithography: A computational view

Andreas Erdmann, Tim Fühner, Peter Evanschitzky et al. · Microelectronic Engineering · 2014 · 35 citations

, , +7

Reducing EUV mask 3D effects by alternative metal absorbers

Vicky Philipsen, Vu Luong, Laurent Souriau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 32 citations

, , +17

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