Peter Evanschitzky

Statistics

Publications

Citations

846

H-Index

Active since

2003

Affiliations

Fraunhofer Institute for Integrated Systems and Device Technology(Current)

IMEC

Schott (Germany)

Carl Zeiss (Germany)

Friedrich-Alexander-Universität Erlangen-Nürnberg

Peter Evanschitzky is an author at Fraunhofer Institute for Integrated Systems and Device Technology specializing in mask fabrication, mask design, and optics.

Publications per year

2003–2022

Publications

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Andreas Erdmann, Dongbo Xu, Peter Evanschitzky et al. · Advanced Optical Technologies · 2017 · 66 citations · Full text

Engineering, Biomedical Engineering, Digital Imaging +14

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2020 · 43 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

Fast near field simulation of optical and EUV masks using the waveguide method

Peter Evanschitzky, Andreas Erdmann · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 38 citations

Engineering, Computational Engineering, Electrical Engineering +15

Optical and EUV projection lithography: A computational view

Andreas Erdmann, Tim Fühner, Peter Evanschitzky et al. · Microelectronic Engineering · 2014 · 37 citations

Engineering, Manufacturing Engineering, Optics +10

Reducing EUV mask 3D effects by alternative metal absorbers

Vicky Philipsen, Vu Luong, Laurent Souriau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 32 citations

Natural Sciences, Materials Engineering, Materials Science +17

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