Paul Gräupner - Concepedia

Author

Paul Gräupner

Carl Zeiss (Germany)

Also Known As

P. Graupner, P. Gräupner, Paul Graupner, Paul Gräupner

Publications

477

Citations

H-Index

Concepts

All Affiliations

Carl Zeiss (Germany)ASML (Netherlands)ASML (United States)Carl Zeiss (United States)Fraunhofer Institute for Integrated Systems and Device Technology

About

Paul Gräupner is an author at Carl Zeiss (Germany) specializing in engineering, optical properties, and optoelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	12	309
2	Medicine	3	3	73
3	Health Sciences	2	2	53
4	Education	1	1	33
5	Management	1	1	10

Paul Gräupner

Publications

432

Citations

H-Index

Page 1

	Year	Citations
Electro-optical effect in aluminum nitride waveguides Paul Gräupner, J.‐C. POMMIER, A. Cachard, Journal of Applied Physics Aluminium NitrideWaveguidesOptical MaterialsEngineeringOptoelectronic Devices	1992	53
Extending optical lithography with immersion Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptical Lithography	2004	33
High-NA EUV lithography: pushing the limits Claus Zahlten, Paul Gräupner, Jan van Schoot,	2019	33
Interactions of 3D mask effects and NA in EUV lithography Jens Timo Neumann, Paul Gräupner, Winfried Kaiser, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2012	32
High-NA EUV lithography optics becomes reality L. Wischmeier, Paul Gräupner, Peter Kürz, Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptic Design	2020	32
Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio Jens Timo Neumann, Paul Gräupner, Winfried Kaiser, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2013	30
How to describe polarization influence on imaging Michael Totzeck, Paul Gräupner, Tilmann Heil, Optical Microlithography XVIII EngineeringMicroscopyAdvanced ImagingOptical PropertiesPolarization Performance	2005	29
The impact of projection lens polarization properties on lithographic process at hyper-NA Bernd Geh, Johannes Ruoff, Jörg Zimmermann, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Projection Lens AberrationsOptical MaterialsEngineeringElectron-beam LithographyMicroscopy	2007	29
Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography Andreas Erdmann, Peter Evanschitzky, Jens Timo Neumann, Journal of Micro/Nanolithography MEMS and MOEMS PhotonicsOptical MaterialsExtreme Ultraviolet LithographyEngineeringPhysics	2016	29
EUV source-mask optimization for 7nm node and beyond Xiaofeng Liu, Rafael C. Howell, Stephen D. H. Hsu, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2014	28

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