Publication | Closed Access
Electro-optical effect in aluminum nitride waveguides
53
Citations
8
References
1992
Year
Aluminium NitrideWaveguidesOptical MaterialsEngineeringOptoelectronic DevicesThin Film Process TechnologyAluminum NitrideOptical PropertiesThin Optical LayersMagnetron SputteringGuided-wave OpticThin Film ProcessingPlanar Waveguide SensorMaterials SciencePhotonicsOptoelectronic MaterialsDepth-graded Multilayer CoatingApplied PhysicsAluminum Nitride WaveguidesThin FilmsOptoelectronics
We fabricated thin optical layers in aluminum nitride by magnetron sputtering. Using the techniques of integrated optics, we characterized the layers and we determined the electro-optic coefficients of AlN: r13 = 0.67 pm/V and r33 = −0.59 pm/V.
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