C. D’Emic

Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues

E. P. Gusev, E. Cartier, D. A. Buchanan et al. · Microelectronic Engineering · 2001 · 385 citations

Materials Engineering, Materials Science, Engineering +8

Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO₂ gate dielectrics

Min Yang, E. P. Gusev, M. Ieong et al. · IEEE Electron Device Letters · 2003 · 164 citations

Semiconductor Technology, Electrical Engineering, Engineering +13

SiGe-on-insulator prepared by wafer bonding and layer transfer for high-performance field-effect transistors

Lida Huang, J. O. Chu, D. Canaperi et al. · Applied Physics Letters · 2001 · 111 citations

Semiconductor Technology, Electrical Engineering, Wafer Scale Processing +15

Microstructure and thermal stability of HfO2 gate dielectric deposited on Ge(100)

E. P. Gusev, Huiling Shang, M. Copel et al. · Applied Physics Letters · 2004 · 96 citations

Engineering, High-κhfo2 Gate Stacks, Ge Surface +20

Bias-temperature instabilities and radiation effects in MOS devices

X. J. Zhou, Daniel M. Fleetwood, J. Félix et al. · IEEE Transactions on Nuclear Science · 2005 · 93 citations

Electrical Engineering, Engineering, Nanoelectronics +9