S. Mudanai

Process Technology Variation

Kelin J. Kuhn, M.D. Giles, D. Becher et al. · IEEE Transactions on Electron Devices · 2011 · 360 citations

Law Technology Scaling, Engineering, Vlsi Design +19

22FFL: A high performance and ultra low power FinFET technology for mobile and RF applications

B. Sell, B. Bigwood, Soonwoo Cha et al. · 2017 · 86 citations

Low-power Electronics, Electrical Engineering, Rf Applications +15

RF CMOS technology scaling in High-k/metal gate era for RF SoC (system-on-chip) applications

C.-H. Jan, M. Agostinelli, H. Deshpande et al. · 2010 · 84 citations

Engineering, Vlsi Design, Rf Soc +16

Modeling of direct tunneling current through gate dielectric stacks

S. Mudanai, Yang-Yu Fan, Qiqing Ouyang et al. · IEEE Transactions on Electron Devices · 2000 · 65 citations

Device Modeling, Gate Dielectric Stack, Electrical Engineering +12

Understanding the effects of wave function penetration on the inversion layer capacitance of NMOSFETs

S. Mudanai, Leonard F. Register, A.F. Tasch et al. · IEEE Electron Device Letters · 2001 · 56 citations

Device Modeling, Electrical Engineering, Engineering +12