Tsutomu Shoki

Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU

Takeo Watanabe, Hiroo Kinoshita, Noriyuki Sakaya et al. · Japanese Journal of Applied Physics · 2005 · 42 citations

Natural Sciences, Chemistry, Materials Science +17

Actinic mask metrology for extreme ultraviolet lithography

Hiroo Kinoshita, Tsuneyuki Haga, Kazuhiro Hamamoto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 33 citations

Engineering, Manufacturing Engineering, Materials Science +12

Mask defect inspection using an extreme ultraviolet microscope

Kazuhiro Hamamoto, Y. Tanaka, S. Y. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 29 citations

Natural Sciences, Materials Engineering, Materials Science +14

Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation

Kazuhiro Hamamoto, Y. Tanaka, Takeo Watanabe et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 28 citations

Natural Sciences, Materials Science, Optical Materials +13

Improvement of total quality on EUV mask blanks toward volume production

Tsutomu Shoki, Masaru Mitsui, Minoru Sakamoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 28 citations

Engineering, Materials Engineering, Materials Science +9