Kazuhiro Hamamoto

Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy

Takeo Watanabe, Hiroo Kinoshita, Hajime Nii et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 37 citations

Vacuum Environment, Chemical Engineering, Mass Spectroscopy +15

Actinic mask metrology for extreme ultraviolet lithography

Hiroo Kinoshita, Tsuneyuki Haga, Kazuhiro Hamamoto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 33 citations

Extreme Ultraviolet Lithography, Engineering, Ophthalmology +14

Mask defect inspection using an extreme ultraviolet microscope

Kazuhiro Hamamoto, Y. Tanaka, S. Y. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 29 citations

Ultraviolet Light, Optical Materials, Engineering +18

Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation

Kazuhiro Hamamoto, Y. Tanaka, Takeo Watanabe et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 28 citations

Ultraviolet Light, Short Wavelength Optic, Optical Materials +21

Evaluation of Finished Extreme Ultraviolet Lithography (EUVL) Masks Using a EUV Microscope

Tsuneyuki Haga, Hiroo Kinoshita, Kazuhiro Hamamoto et al. · Japanese Journal of Applied Physics · 2003 · 24 citations

Short Wavelength Optic, Engineering, Electron-beam Lithography +24