Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy

Takeo Watanabe, Hiroo Kinoshita, Hajime Nii, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Vacuum EnvironmentChemical EngineeringMass SpectroscopyExtreme Ultraviolet LithographyKrf Lithography +13

Actinic mask metrology for extreme ultraviolet lithography

Hiroo Kinoshita, Tsuneyuki Haga, Kazuhiro Hamamoto, +7

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Extreme Ultraviolet LithographyEngineeringOphthalmologyMicrofabricationMicroscopy +12

Mask defect inspection using an extreme ultraviolet microscope

Kazuhiro Hamamoto, Y. Tanaka, S. Y. Lee, +6

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Ultraviolet LightOptical MaterialsEngineeringMicroscopyPhase Defect +16

Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation

Kazuhiro Hamamoto, Y. Tanaka, Takeo Watanabe, +7

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Ultraviolet LightShort Wavelength OpticOptical MaterialsEngineeringElectron-beam Lithography +19

Evaluation of Finished Extreme Ultraviolet Lithography (EUVL) Masks Using a EUV Microscope

Tsuneyuki Haga, Hiroo Kinoshita, Kazuhiro Hamamoto, +5

Japanese Journal of Applied Physics

Short Wavelength OpticEngineeringElectron-beam LithographyMicroscopyOptic Design +22

Kinetics and mechanisms of the Bamberger rearrangement. Part 4. Rearrangement of sterically hindered phenylhydroxylamines to 4-aminophenols in aqueous sulphuric acid solution

Takaaki Sone, Kazuhiro Hamamoto, Yoshiyuki Seiji, +2

Journal of the Chemical Society Perkin Transactions 2

Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

Hiroo Kinoshita, Kazuhiro Hamamoto, Nobuyuki Sakaya, +2

Japanese Journal of Applied Physics

EngineeringElectron-beam LithographyMicroscopyMultilayer FilmX-ray Imaging +23

Fine Pattern Replication by EUV Lithography.

Kazuhiro Hamamoto, Takeo Watanabe, Harushige Tsubakino, +3

Journal of Photopolymer Science and Technology

Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyMicroscopy +16

Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System

Takeo Watanabe, Hiroo Kinoshita, Kazuhiro Hamamoto, +5

Japanese Journal of Applied Physics

Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyOptical Testing +18

Characteristics of CA Resist in EUV Lithography.

Kazuhiro Hamamoto, Takeo Watanabe, Hideo Hada, +2

Journal of Photopolymer Science and Technology

Materials ScienceElectrical EngineeringKrf ResistEngineeringElectron-beam Lithography +12