T. Dalton

Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide

T. E. F. M. Standaert, Christer Hedlund, Eric Joseph et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 281 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature

Marcus A. Worsley, Stacey F. Bent, S. M. Gates et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 87 citations

Natural Sciences, Materials Engineering, Materials Science +17

Patterning of fluorine-, hydrogen-, and carbon-containing SiO2-like low dielectric constant materials in high-density fluorocarbon plasmas: Comparison with SiO2

T. E. F. M. Standaert, P. J. Matsuo, Susan D. Allen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 76 citations

Engineering, Materials Engineering, Materials Science +14

Microtrench Formation in Polysilicon Plasma Etching over Thin Gate Oxide

T. Dalton, John Arnold, Herbert H. Sawin et al. · Journal of The Electrochemical Society · 1993 · 67 citations

Engineering, Electrical Engineering, Materials Science +15

Low open-area endpoint detection using a PCA-based T/sup 2/ statistic and Q statistic on optical emission spectroscopy measurements

David A. White, Brian Goodlin, Aaron E. Gower et al. · IEEE Transactions on Semiconductor Manufacturing · 2000 · 57 citations

Natural Sciences, Electrical Engineering, Photonics +16