Christer Hedlund

Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide

T. E. F. M. Standaert, Christer Hedlund, Eric Joseph et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 281 citations

Natural Sciences, Materials Engineering, Materials Science +17

Microloading effect in reactive ion etching

Christer Hedlund, Hans‐Olof Blom, S. Berg · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 124 citations

Engineering, Materials Engineering, Materials Science +13

Selective SiO2-to-Si3N4 etching in inductively coupled fluorocarbon plasmas: Angular dependence of SiO2 and Si3N4 etching rates

M. Schaepkens, G. S. Oehrlein, Christer Hedlund et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 68 citations

Engineering, Materials Engineering, Materials Science +17

Oxidation and Induced Damage in Oxygen Plasma In Situ Wafer Bonding

Donato Pasquariello, Christer Hedlund, Klas Hjort · Journal of The Electrochemical Society · 2000 · 67 citations

Natural Sciences, Materials Engineering, Materials Science +17

Anisotropic etching of Z-cut quartz

Christer Hedlund, U. Lindberg, U Bucht et al. · Journal of Micromechanics and Microengineering · 1993 · 59 citations

Engineering, Materials Engineering, Materials Science +16