Anisotropic etching of Z-cut quartz

Abstract

The etch rate in monocrystalline quartz depends on the crystalline orientation. Etch-rate diagrams for micromachining of monocrystalline quartz in, for instance, hydrofluoride-based etchants, are a necessity if one requires the best manufacturing conditions for an etched structure. In this paper we use the development of side-wall profiles in etched grooves, on a Z-cut quartz wafer, to produce two-dimensional etch diagrams. The etch conditions are eight combinations of temperature, from 22 degrees C to 80 degrees C, and etchant mixtures of HF and NH4F diluted in water.