H. Oertel

Resolution limits in electron-beam induced tungsten deposition

K. T. Kohlmann-von Platen, J. Chlebek, K. Reimer et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 81 citations

Materials Science, Electron-beam Induced Tungsten, Electron-beam Induced Deposition +14

Adhesion problems in deep-etch x-ray lithography caused by fluorescence radiation from the plating base

F. J. Pantenburg, J. Chlebek, A. El‐Kholi et al. · Microelectronic Engineering · 1994 · 31 citations

Materials Science, Adhesion Problems, Engineering +11

Radiation damage effects in boron nitride mask membranes subjected to x-ray exposures

WS Johnson, R. Lévy, Douglas J. Resnick et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 30 citations

X-ray Spectroscopy, Engineering, Cubic Boron Nitride +19

Highly-sensitive novolak-based positive X-ray resist

K.-F. Dössel, H.‐L. Huber, H. Oertel · Microelectronic Engineering · 1986 · 26 citations

Materials Science, X-ray Spectroscopy, Engineering +4

Resolution limits in x-ray lithography calculated by means of x-ray lithography simulator <scp>X</scp> <scp>M</scp> <scp>A</scp> <scp>S</scp>

H. Betz, K. Heinrich, A. Heuberger et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1986 · 24 citations

Optical Materials, Engineering, Electron-beam Lithography +18