4
Publications
165
Citations
4
H-Index
1992
Active since
Affiliations
K. T. Kohlmann-von Platen is an author at Fraunhofer Institute for Silicon Technology specializing in applied physics, engineering, and surface science.
Top concepts
EngineeringApplied PhysicsSurface ScienceMaterial SciencePhysicsMicroelectronicsMicrofabricationElectrical EngineeringDesignTechnology
Publications per year
1992–1999
4
4
Resolution limits in electron-beam induced tungsten deposition
K. T. Kohlmann-von Platen, J. Chlebek, K. Reimer et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 81 citations
Materials Science, Electron-beam Induced Tungsten, Electron-beam Induced Deposition +14
Electron-beam induced etching of resist with water vapor as the etching medium
K. T. Kohlmann-von Platen, W.H. Bruenger · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 13 citations
Materials Engineering, Electrical Engineering, H2o Vapor +15
Klaus Reimer, Rainer Engelke, Ulrich Hofmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations
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