Klaus Reimer

<title>Micro-optic fabrication using one-level gray-tone lithography</title>

Klaus Reimer, Hans Joachim Quenzer, M. Juerss et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 47 citations

Engineering, Electron-beam Lithography, Microscopy +20

Adhesion-Inhibited Surfaces. Coated and Uncoated Interdigitated Electrode Arrays in the Micrometer and Submicrometer Range

Thomas Schnelle, Torsten Müller, Andreas Voigt et al. · Langmuir · 1996 · 24 citations

Electrohydrodynamics, Engineering, Electrode Plane +20

Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Stefan Eder-Kapl, E. Haugeneder, H. Langfischer et al. · Microelectronic Engineering · 2006 · 22 citations

Engineering, Beam Lithography, Electron-beam Lithography +9

<title>Fabrication of microrelief surfaces using a one-step lithography process</title>

Klaus Reimer, Ulrich Hofmann, M. Juerss et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 17 citations

Optical Materials, Engineering, Microscopy +17

<title>Progress in gray-tone lithography and replication techniques for different materials</title>

Klaus Reimer, Rainer Engelke, Ulrich Hofmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Optical Materials, Engineering, Micro-optical Component +20