Stefan Eder-Kapl

Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

Elmar Platzgummer, A. Biedermann, H. Langfischer et al. · Microelectronic Engineering · 2006 · 46 citations

Engineering, Materials Engineering, Materials Science +13

Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Stefan Eder-Kapl, E. Haugeneder, H. Langfischer et al. · Microelectronic Engineering · 2006 · 22 citations

Engineering, Electrical Engineering, Manufacturing Engineering +5

Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp

Michael Muehlberger, Michael W. Boehm, Iris Bergmair et al. · Microelectronic Engineering · 2011 · 16 citations

Engineering, Materials Engineering, Materials Science +9

Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition

Christoph Ebm, Elmar Platzgummer, Hans Loeschner et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 12 citations

Engineering, Materials Engineering, Materials Science +14