Concepedia

Hans Loeschner

HL

Statistics

Publications

25

Citations

536

H-Index

14

Active since

1999

Affiliations

IMS Nanofabrication (Austria)(Current)

Fraunhofer Institute for Silicon Technology

Institut für Mikroelektronik Stuttgart

Infineon Technologies (Germany)

University of Applied Sciences Technikum Wien

Hans Loeschner is an author at IMS Nanofabrication (Austria) specializing in microfabrication, engineering, and manufacturing engineering.

Publications per year

1999–2013

25

Publications

25

UV-NIL with working stamps made from Ormostamp

M. Mühlberger, Iris Bergmair, Anna Klukowska et al. · Microelectronic Engineering · 2008 · 60 citations

Natural Sciences, Fine Arts, Microfabrication +2

Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

Elmar Platzgummer, A. Biedermann, H. Langfischer et al. · Microelectronic Engineering · 2006 · 46 citations

Engineering, Materials Engineering, Materials Science +13

Measuring acid generation efficiency in chemically amplified resists with all three beams

Charles R. Szmanda, Robert L. Brainard, Joseph F. Mackevich et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 46 citations

Medicine, Chemistry, Radiation Dosimetry +11

Electron multibeam technology for mask and wafer writing at 0.1 nm address grid

Elmar Platzgummer, Christof Klein, Hans Loeschner · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 46 citations · Full text

Engineering, Manufacturing Engineering, Microelectronics +6

Ion projection direct structuring for patterning of magnetic media

Andreas Dietzel, Rüdiger Berger, H. Grimm et al. · IEEE Transactions on Magnetics · 2002 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +17

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