Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp

Nanoimprint lithography

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Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

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Improving stamps for 10 nm level wafer scale nanoimprint lithography

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Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography

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Natural Sciences, Materials Engineering, Materials Science +13

Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist

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