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Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp

DOI

16

Citations

9

References

2011

Year

Michael Muehlberger, Michael W. Boehm, Iris Bergmair, Mustapha Chouiki, Rainer Schoeftner, Gerald Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, R. Miller,
Microelectronic Engineering

References

YearCitations

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