Concepedia

E. Haugeneder

EH

Statistics

Publications

4

Citations

60

H-Index

4

Active since

1998

Affiliations

University of Kassel(Current)

Institut für Mikroelektronik Stuttgart

Siemens (Germany)

E. Haugeneder is an author at University of Kassel specializing in semiconductor devices, engineering, and etching processes.

Publications per year

1998–2006

4

Publications

4

Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Stefan Eder-Kapl, E. Haugeneder, H. Langfischer et al. · Microelectronic Engineering · 2006 · 22 citations

Engineering, Electrical Engineering, Manufacturing Engineering +5

PN and SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, E. Haugeneder et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Engineering, Materials Engineering, Materials Science +14

<i>p-n</i> junction-based wafer flow process for stencil mask fabrication

Ivo W. Rangelow, F.G. Shi, B. Volland et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 13 citations

Engineering, Electrical Engineering, Materials Science +17

Directly sputtered stress-compensated carbon protective layer for silicon stencil masks

P. Hudek, P. Hrkút, Milan Držík et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 12 citations

Engineering, Materials Engineering, Materials Science +17

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