E. Haugeneder

Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Stefan Eder-Kapl, E. Haugeneder, H. Langfischer et al. · Microelectronic Engineering · 2006 · 22 citations

Engineering, Beam Lithography, Electron-beam Lithography +9

PN and SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, E. Haugeneder et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Materials Science, Wafer Scale Processing, Engineering +14

<i>p-n</i> junction-based wafer flow process for stencil mask fabrication

Ivo W. Rangelow, F.G. Shi, B. Volland et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 13 citations

Materials Science, Electrical Engineering, Wafer Scale Processing +15

Directly sputtered stress-compensated carbon protective layer for silicon stencil masks

P. Hudek, P. Hrkút, Milan Držík et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 12 citations

Materials Engineering, Materials Science, Electrical Engineering +13