Concepedia

H. Rathore

HR

Statistics

Publications

11

Citations

659

H-Index

10

Active since

1992

Affiliations

IBM (United States)(Current)

IBM Research - Thomas J. Watson Research Center

Advanced Micro Devices (United States)

Toshiba (United States)

H. Rathore is an author at IBM (United States) specializing in electronic materials, interconnect technology, and materials science.

Publications per year

1992–2005

11

Publications

11

Full copper wiring in a sub-0.25 μm CMOS ULSI technology

D. Edelstein, J. Heidenreich, R. Goldblatt et al. · 2002 · 352 citations

Engineering, Computer Engineering, Electrical Engineering +17

A high performance liner for copper damascene interconnects

D. Edelstein, Cyprian Uzoh, C. Cabral et al. · 2001 · 92 citations

Engineering, Computer Engineering, Electrical Engineering +17

Scaling effect on electromigration in on-chip Cu wiring

C.‐K. Hu, R. Rosenberg, H. Rathore et al. · 2003 · 66 citations

Engineering, Electrical Engineering, Materials Science +17

Electromigration improvements with titanium underlay and overlay in Al(Cu) metallurgy

J.J. Estabil, H. Rathore, E. Levine · 2002 · 23 citations

Engineering, Materials Engineering, Materials Science +17

Measurements of effective thermal conductivity for advanced interconnect structures with various composite low-k dielectrics

F. Chen, J. Gill, D. Harmon et al. · 2004 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +17

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