D. Harmon

Experimental evidence of T/sub BD/ power-law for voltage dependence of oxide breakdown

Ernest Y. Wu, A. Vayshenker, E. Nowak et al. · IEEE Transactions on Electron Devices · 2002 · 145 citations

Electrical Engineering, Poisson Random Statistics, Engineering +12

Interplay of voltage and temperature acceleration of oxide breakdown for ultra-thin gate oxides

Ernest Y. Wu, J. Suñé, W. Lai et al. · Solid-State Electronics · 2002 · 122 citations

Electrical Engineering, Engineering, Stress-induced Leakage Current +8

Reaction Mechanisms of Plasma‐ and Thermal‐Assisted Chemical Vapor Deposition of Tetraethylorthosilicate Oxide Films

S. Nguyen, D. Dobuzinsky, D. Harmon et al. · Journal of The Electrochemical Society · 1990 · 91 citations

Engineering, Cvd Films, Thin Film Process Technology +17

CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics

Ernest Y. Wu, E. Nowak, A. Vayshenker et al. · IBM Journal of Research and Development · 2002 · 84 citations

Cmos Scaling, Engineering, Integrated Circuits +17

A Thin-Film SOI 180nm CMOS RF Switch Technology

A. Botula, Alvin Joseph, J. Slinkman et al. · 2009 · 84 citations

Low-power Electronics, Electrical Engineering, Rf Switch Applications +12