D. Dobuzinsky

Reaction Mechanisms of Plasma‐ and Thermal‐Assisted Chemical Vapor Deposition of Tetraethylorthosilicate Oxide Films

S. Nguyen, D. Dobuzinsky, D. Harmon et al. · Journal of The Electrochemical Society · 1990 · 91 citations

Natural Sciences, Materials Engineering, Materials Science +17

CVD of fluorosilicate glass for ULSI applications

M. J. Shapiro, S. Nguyen, T. Matsuda et al. · Thin Solid Films · 1995 · 67 citations

Natural Sciences, Materials Engineering, Materials Science +4

Device design considerations for ultra-thin SOI MOSFETs

B. Doris, M. Ieong, Tinggang Zhu et al. · 2003 · 56 citations

Engineering, Electrical Engineering, Materials Science +17

Substrate Trenching Mechanism during Plasma and Magnetically Enhanced Polysilicon Etching

S. Nguyen, D. Dobuzinsky, S. R. Stiffler et al. · Journal of The Electrochemical Society · 1991 · 46 citations

Engineering, Electrical Engineering, Physics +17

Gate Length and Performance Scaling of Undoped-Body Extremely Thin SOI MOSFETs

A. Majumdar, Xinlin Wang, Arvind Kumar et al. · IEEE Electron Device Letters · 2009 · 37 citations

Engineering, Electrical Engineering, Materials Science +17