Concepedia

R. Goldblatt

RG

Statistics

Publications

15

Citations

697

H-Index

12

Active since

1986

Affiliations

IBM (United States)(Current)

IBM Research - Thomas J. Watson Research Center

R. Goldblatt is an author at IBM (United States) specializing in engineering, interconnect technology, and integrated circuit design.

Publications per year

1986–2004

15

Publications

15

Full copper wiring in a sub-0.25 μm CMOS ULSI technology

D. Edelstein, J. Heidenreich, R. Goldblatt et al. · 2002 · 352 citations

Engineering, Computer Engineering, Electrical Engineering +17

A 480-MHz RISC microprocessor in a 0.12-μm L/sub eff/ CMOS technology with copper interconnects

C. Akrout, Jörg Bialas, M. Canada et al. · IEEE Journal of Solid-State Circuits · 1998 · 65 citations

Engineering, Computer Engineering, Electrical Engineering +17

A high performance 90nm SOI technology with 0.992 μm/sup 2/ 6T-SRAM cell

Mukesh Khare, S.H. Ku, R. A. Donaton et al. · 2003 · 43 citations

Engineering, Computer Engineering, Electrical Engineering +17

A high performance 0.13 μm copper BEOL technology with low-k dielectric

R. Goldblatt, B. Agarwala, M.B. Anand et al. · 2002 · 30 citations

Engineering, Materials Engineering, Materials Science +15

A high-performance sub-0.25 μm CMOS technology with multiple thresholds and copper interconnects

L.T. Su, R. Schulz, J. Adkisson et al. · 2002 · 26 citations

Engineering, Computer Engineering, Electrical Engineering +17

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