Concepedia

Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition

Pei‐Ci Jhang, Chi-Pin Lu, Jung-Yu Shieh, Ling-Wu Yang, Tahone Yang, Kuang‐Chao Chen, Chih-Yuan Lu

Solid-State Electronics · 2017 · 15 citations · 27 references

Concepts

Natural SciencesMaterials EngineeringMaterials ScienceSemiconductor MaterialsSurface ScienceThin FilmsAtomic Layer DepositionSemiconductor PhysicsSemiconductor SurfacesSemiconductor Thin FilmsThin-film DepositionThin-film MaterialsNitride Thin FilmsNitrides Thin FilmsPlasma-enhanced Atomic Layer DepositionPlasma-enhanced DepositionSilicon Nitride

References

27

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 881 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

Atomic layer epitaxy

C. H. L. Goodman, M. Pessa · Journal of Applied Physics · 1986 · 294 citations

Natural Sciences, Materials Engineering, Materials Science +17

Mechanism of SiN x H y Deposition from NH 3 ‐ SiH4 Plasma

Donald L. Smith, Andrew S. Alimonda, Chau‐Chen Chen et al. · Journal of The Electrochemical Society · 1990 · 246 citations

Natural Sciences, Chemistry, Materials Science +15

Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapor deposition

Gregory N. Parsons, Jun H. Souk, J. Batey · Journal of Applied Physics · 1991 · 212 citations

Natural Sciences, Materials Science, Physics +17

Technology for sub-50nm DRAM and NAND flash manufacturing

Kinam Kim · 2006 · 170 citations

Engineering, Computer Engineering, Electrical Engineering +17