Silicon Nitride

Silicon Nitride is a ceramic thin-film material used in microelectromechanical systems and microfabrication processes, distinguished by its high mechanical strength, thermal stability, and resistance to oxidation and chemical etching, making it suitable for structural and passivation layers in semiconductor devices.

9.1K

Publications

384.1K

Citations

27.6K

Authors

3.5K

Institutions

Publications per year

2017–2026

1.6K

Authors

27.6K

  1. KH
    Kiyoshi Hirao

    National Institute of Advanced Industrial Science and Technology, Japan

    63 publications · 4.1K citations

    32

    h-index

  2. MM
    Mamoru Mitomo

    National Institute for Materials Science, Japan

    44 publications · 2.3K citations

    27

    h-index

  3. TO
    Tatsuki Ohji

    National Institute of Advanced Industrial Science and Technology, Japan

    45 publications · 2.1K citations

    26

    h-index

  4. JK
    Jerzy Kanicki

    University of Michigan, United States

    38 publications · 2.5K citations

    26

    h-index

  5. GP
    Giuseppe Pezzotti

    Kyoto Institute of Technology, Japan

    44 publications · 1.9K citations

    25

    h-index

1–5 of 27.6K

Venues

  1. Journal of the American Ceramic Society

    553 publications · 31.8K citations

    88

    h-index

  2. Applied Physics Letters

    585 publications · 30.7K citations

    84

    h-index

  3. Journal of Applied Physics

    411 publications · 20.6K citations

    71

    h-index

  4. Journal of The Electrochemical Society

    JES · 252 publications · 11.6K citations

    57

    h-index

  5. Optics Express

    176 publications · 9.5K citations

    54

    h-index

1–5