Andrew S. Alimonda

Mechanism of SiN x  H  y Deposition from  NH 3 ‐ SiH4 Plasma

Donald L. Smith, Andrew S. Alimonda, Chau‐Chen Chen et al. · Journal of The Electrochemical Society · 1990 · 245 citations

Optical Materials, Engineering, Plasma Science +20

Mechanism of SiN<i>x</i>H<i>y</i> deposition from N2–SiH4 plasma

Donald L. Smith, Andrew S. Alimonda, Frederick J. von Preissig · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 87 citations

Engineering, Glow Discharge, Deposition Electrode +18

Chemistry of SiO2 Plasma Deposition

Donald L. Smith, Andrew S. Alimonda · Journal of The Electrochemical Society · 1993 · 45 citations

Chemical Engineering, Plasma Electronics, Plasma Species +11

A new flip-chip technology for high-density packaging

Donald L. Smith, Andrew S. Alimonda · 2002 · 45 citations

Cantilevered Metal Micro-springs, Engineering, Mechanical Engineering +19

Striped-substrate double-heterostructure lasers

R. D. Burnham, D. R. Scifres, J. C. Tramontana et al. · IEEE Journal of Quantum Electronics · 1975 · 25 citations

Photonics, Electrical Engineering, Engineering +11