Design Methodology and Protection Strategy for ESD-CDM Robust Digital System Design in 90-nm and 130-nm Technologies

Tze Wee Chen, Choshu Ito, W.M. Loh, Wei Wang, Kalyan Doddapaneni, Subhasish Mitra, R.W. Dutton

IEEE Transactions on Electron Devices · 2009 · 11 citations · 10 references

Concepts

Abstract

<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> A design methodology and protection strategy for ESD charged-device-model (CDM) robust digital systems is presented using a scalable postbreakdown transistor macromodel for 90- and 130-nm technologies. The macromodel was implemented in a design tool to aid reliable chip design and used to predict function failure in three different system-on-chip design examples. Simulations agree well with failure analysis observations, verifying the validity of the macromodel. A “correct-by-construction” protection strategy for overcoming induced ESD-CDM events is also proposed. No ESD-CDM-related function failures are observed for product chips protected with this strategy. </para>

References

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