Publication | Closed Access
Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
259
Citations
11
References
2002
Year
ReliabilityElectrical EngineeringReliability EngineeringEngineeringHardware ReliabilityBias Temperature InstabilityTime-dependent Dielectric BreakdownComputer EngineeringRing Oscillator CircuitRing OscillatorFet GateCircuit ReliabilityMosfet GateDevice ReliabilityMicroelectronicsPhysic Of FailureDigital Circuit Operation
The influence of FET gate oxide breakdown on the performance of a ring oscillator circuit is studied using statistical tools, emission microscopy, and circuit analysis. It is demonstrated that many hard breakdowns can occur in this circuit without affecting its overall function. Time-to-breakdown data measured on individual FETs are shown to scale correctly to circuit level. SPICE simulations of the ring oscillator with the affected FET represented by an equivalent circuit confirm the measured influence of the breakdown on the circuit's frequency, the stand-by and the operating currents. It is concluded that if maintaining a digital circuit's logical functionality is the sufficient reliability criterion, a nonzero probability exists that the circuit will remain functional beyond the first gate oxide breakdown. Consequently, relaxation of the present reliability criterion in certain cases might be possible.
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