Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 18 citations · 5 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDevice ModelingDevice SimulationP-n JunctionsScanning Probe MicroscopySemiconductor InterfacesSemiconductor PhysicsAccuracyCapacitanceCapacitance Measurement TechniquesJunction ModelingP-n Junction CharacteristicsScanning Capacitance MicroscopySemiconductor Junctions
In this work, we investigate the theoretical and the experimental accuracy limits of the delineation of pn junctions by scanning capacitance microscopy. We compare three different techniques basing both on experimental data and on one- and two-dimensional simulations of scanning capacitance measurements of epitaxial and shallow junctions.
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Scanning capacitance microscopy measurements using diamond-coated probes
Hidehiko Yabuhara, Mauro Ciappa, Wolfgang Fichtner · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 22 citations
Natural Sciences, Materials Engineering, Materials Science +16