Concepedia

Leakage current conduction behaviors of 0.65nm equivalent-oxide-thickness HfZrLaO gate dielectrics

Kunsong Lin, J.Y. Chen, H. W. Hsu, H. W. Chen, C.H. Liu

Solid-State Electronics · 2012 · 10 citations · 31 references

DOI

Concepts

References

31

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

, , +17

Band offsets of wide-band-gap oxides and implications for future electronic devices

John Robertson · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 2K citations

, , +17

An investigation of surface states at a silicon/silicon oxide interface employing metal-oxide-silicon diodes

Lewis M. Terman · Solid-State Electronics · 1962 · 1.4K citations

, , +14

Chemical vapor deposition and characterization of HfO2 films from organo-hafnium compounds

Mária Balog, M. Schieber, M. Michman et al. · Thin Solid Films · 1977 · 353 citations

, , +9

Reliability projection for ultra-thin oxides at low voltage

J. H. Stathis, D. J. DiMaria · 2002 · 272 citations

, , +17