Gate Dielectrics

Gate Dielectrics is an insulating material layer in a field-effect transistor that separates the gate electrode from the semiconductor channel, enabling the control of charge carriers in the channel through an applied electric field while minimizing gate leakage current, particularly critical in wide-bandgap semiconductor devices for high-power and high-temperature operation.

3.5K

Publications

174.6K

Citations

11.6K

Authors

1.4K

Institutions

Publications per year

2017–2026

621

Authors

11.6K

  1. DK
    Dim‐Lee Kwong

    Institute of Microelectronics, Singapore

    53 publications · 2K citations

    28

    h-index

  2. RC
    Rino Choi

    Inha University, South Korea

    42 publications · 2.1K citations

    27

    h-index

  3. GG
    G. Groeseneken

    IMEC, Belgium

    41 publications · 2.2K citations

    25

    h-index

  4. EP
    E. P. Gusev

    IBM Research - Thomas J. Watson Research Center, United States

    30 publications · 2.8K citations

    25

    h-index

  5. GL
    G. Lucovsky

    North Carolina State University, United States

    36 publications · 1.8K citations

    24

    h-index

1–5 of 11.6K

Venues

  1. Applied Physics Letters

    499 publications · 29.2K citations

    87

    h-index

  2. IEEE Electron Device Letters

    315 publications · 16.1K citations

    68

    h-index

  3. IEEE Transactions on Electron Devices

    258 publications · 13.3K citations

    57

    h-index

  4. Journal of Applied Physics

    176 publications · 18.2K citations

    53

    h-index

  5. ACS Applied Materials & Interfaces

    67 publications · 3K citations

    35

    h-index

1–5