116
Publications
8.2K
Citations
50
H-Index
1980
Active since
J. H. Stathis is an author at IBM Research - Thomas J. Watson Research Center specializing in engineering, applied physics, and electrical engineering.
Top concepts
EngineeringApplied PhysicsElectrical EngineeringMicroelectronicsNanoelectronicsPhysicsMaterial ScienceElectronic PackagingElectrical InsulationCondensed Matter Physics
Publications per year
1980–2020
116
116
Percolation models for gate oxide breakdown
J. H. Stathis · Journal of Applied Physics · 1999 · 522 citations
Device Modeling, Defect Tolerance, Electrical Engineering +15
Luminescence degradation in porous silicon
M. A. Tischler, R. T. Collins, J. H. Stathis et al. · Applied Physics Letters · 1992 · 465 citations
Dielectric breakdown mechanisms in gate oxides
S. Lombardo, J. H. Stathis, B.P. Linder et al. · Journal of Applied Physics · 2005 · 427 citations
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