Optimization of HSQ resist e-beam processing technique on GaAs material

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

Hideo Namatsu, Yasuo Takahashi, Kenji Yamazaki et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 286 citations

Engineering, Materials Engineering, Materials Science +11

Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations

H. Namatsu, Toru Yamaguchi, Masao Nagase et al. · Microelectronic Engineering · 1998 · 156 citations

Natural Sciences, Materials Engineering, Materials Science +8

Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist

W. Henschel, Yordan M. Georgiev, H. Kurz · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 151 citations

Engineering, Materials Engineering, Materials Science +13

Materials Issues with Thin Film Hydrogen Silsesquioxane Low K Dielectrics

M. Albrecht, Craig Blanchette · Journal of The Electrochemical Society · 1998 · 113 citations

Natural Sciences, Chemistry, Materials Science +17

Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography

F.C.M.J.M. van Delft, J. Weterings, A. K. van Langen-Suurling et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 111 citations

Engineering, Materials Engineering, Materials Science +14