A. K. van Langen-Suurling

Author

Delft University of Technology

Also Known As

A. K. van Langen-Suurling, A.K. van Langen-Suurling, Anja K. van Langen-Suurling

Publications

457

Citations

H-Index

Concepts

All Affiliations

Delft University of Technology Utrecht University Institute for Atomic and Molecular Physics Philips (Netherlands)

About

A. K. van Langen-Suurling is an author at Delft University of Technology specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	245
2	Applied Physics	5	5	245
3	Materials Science	4	4	213
4	Natural Sciences	1	1	32
5	Chemistry	1	1	32

A. K. van Langen-Suurling

Publications

452

Citations

H-Index

Page 1

	Year	Citations
Template-Induced Growth of Close-Packed and Non-Close-Packed Colloidal Crystals during Solvent Evaporation Jacob P. Hoogenboom, C. Rétif, E. de Bres, Nano Letters	2004	167
Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography F.C.M.J.M. van Delft, J. Weterings, A. K. van Langen-Suurling, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceBilayer ResistEngineeringElectron-beam LithographyBeam Lithography	2000	111
Hard-Sphere Crystals with hcp and Non-Close-Packed Structure Grown by Colloidal Epitaxy Jacob P. Hoogenboom, A. K. van Langen-Suurling, J. Romijn, Physical Review Letters Materials ScienceCrystal StructureColloidal MaterialEpitaxial GrowthEngineering	2003	57
Epitaxial growth of a colloidal hard-sphere hcp crystal and the effects of epitaxial mismatch on crystal structure Jacob P. Hoogenboom, A. K. van Langen-Suurling, J. Romijn, Physical Review E	2004	40
Epitaxial Crystal Growth of Charged Colloids Jacob P. Hoogenboom, Anand Yethiraj, A. K. van Langen-Suurling, Physical Review Letters Materials ScienceDensity-matched ColloidsCrystal StructureColloidal MaterialBcc Crystals	2002	35
Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies M. Peuker, Michael Lim, Henry I. Smith, Microelectronic Engineering PhotonicsPhotonic SensorEngineeringBeam LithographyPhysics	2002	32
Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography A.J. van Dodewaard, Wilhelmus S. M. M. Ketelaars, R.F.M. Roes, Microelectronic Engineering Materials ScienceEngineeringElectron-beam LithographyPhysicsBeam Lithography	2000	10

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