Publication | Closed Access
Solid solutions GeSi grown by MBE on a low temperature Si (001) buffer layer: specific features of plastic relaxation
19
Citations
39
References
2001
Year
Materials EngineeringMaterials ScienceEpitaxial GrowthSolid Solutions GesiEngineeringSurface ScienceApplied PhysicsPlastic RelaxationSemiconductor MaterialSemiconductor Device FabricationMolecular Beam EpitaxySilicon On InsulatorLow Temperature Si
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