Low-temperature Growth

Low-Temperature Growth is a semiconductor crystal growth technique that employs processing temperatures significantly below conventional methods to enable reduced thermal damage, suppressed dopant diffusion, and compatibility with temperature-sensitive substrates.

4.6K

Publications

201.6K

Citations

17.6K

Authors

2.7K

Institutions

Publications per year

2017–2026

584

Authors

17.6K

  1. YQ
    Yitai Qian

    University of Science and Technology of China, China

    18 publications · 1.1K citations

    17

    h-index

  2. GB
    G. B. Stringfellow

    University of Utah, United States

    15 publications · 587 citations

    14

    h-index

  3. MW
    M. Willander

    Linköping University, Sweden

    14 publications · 1.3K citations

    13

    h-index

  4. MM
    Masanobu Miyao

    Kyushu University, Japan

    14 publications · 402 citations

    13

    h-index

  5. MG
    M. Godlewski

    Polish Academy of Sciences, Poland

    12 publications · 628 citations

    12

    h-index

1–5 of 17.6K

Venues

  1. Applied Physics Letters

    490 publications · 24.7K citations

    75

    h-index

  2. Journal of Applied Physics

    272 publications · 11.1K citations

    49

    h-index

  3. Journal of Crystal Growth

    324 publications · 9.8K citations

    44

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 222 publications · 7.7K citations

    44

    h-index

  5. Journal of Bacteriology

    JB · 69 publications · 5.3K citations

    40

    h-index

1–5