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Solution-Liquid-Solid Growth of Crystalline III-V Semiconductors: An Analogy to Vapor-Liquid-Solid Growth
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Citations
27
References
1995
Year
EngineeringCrystal Growth TechnologySolid-state ChemistryChemistrySemiconductor NanostructuresSemiconductorsVapor-liquid-solid GrowthIi-vi SemiconductorLarger CrystalsEpitaxial GrowthCompound SemiconductorMaterials ScienceCrystalline Iii-v SemiconductorsSolution-liquid-solid GrowthLow TemperaturesElectronic MaterialsApplied PhysicsChemical Vapor DepositionIii-v Semiconductors
Until now, micrometer-scale or larger crystals of the III-V semiconductors have not been grown at low temperatures for lack of suitable crystallization mechanisms for highly covalent nonmolecular solids. A solution-liquid-solid mechanism for the growth of InP, InAs, and GaAs is described that uses simple, low-temperature (≤203°C), solution-phase reactions. The materials are produced as polycrystalline fibers or near-single-crystal whiskers having widths of 10 to 150 nanometers and lengths of up to several micrometers. This mechanism shows that processes analogous to vapor-liquid-solid growth can operate at low temperatures; similar synthesis routes for other covalent solids may be possible.
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