Publication | Closed Access
Effect of Device Variants in 32 nm and 45 nm SOI on SET Pulse Distributions
26
Citations
12
References
2013
Year
EngineeringSilicon On InsulatorIon ImplantationDevice VariantsSet Pulse DistributionsNm SoiSingle-event TransientSet ResponseElectronic CircuitPhotonicsElectrical EngineeringPhysicsReverse Cumulative DistributionHigh-frequency DeviceBias Temperature InstabilityComputer EngineeringSingle Event EffectsMicroelectronicsLow-power ElectronicsApplied PhysicsOptoelectronics
Single-Event Transient (SET) pulse widths were obtained from the heavy-ion irradiation of inverters designed in 32 nm and 45 nm silicon-on-insulator (SOI). The effects of threshold voltage and body contact are shown to significantly impact the SET response of advanced SOI technologies. Also, the reverse cumulative distribution is extracted from the count distribution for several targets and is shown to be a useful aid in selecting the temporal filtering for radiation-hardened circuitry.
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