Etching control of benzocyclobutene in CF4/O2 and SF6/O2 plasmas with thick photoresist and titanium masks

Wafer-Level Packaging Technology for High-<tex>$Q$</tex>On-Chip Inductors and Transmission Lines

G. Carchon, Eric Beyne · IEEE Transactions on Microwave Theory and Techniques · 2004 · 91 citations

Engineering, Electrical Engineering, Materials Science +17

Relation of polymer structure to plasma etching behavior: Role of atomic fluorine

Stephen R. Cain, Frank D. Egitto, F. Emmi · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 70 citations

Natural Sciences, Materials Engineering, Materials Science +17

Etching chemistry of benzocyclobutene (BCB) low-<i>k</i>dielectric films in F2+O2 and Cl2+O2 high density plasmas

Steven A. Vitale, Heeyeop Chae, Herbert H. Sawin · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 42 citations

Natural Sciences, Chemistry, Materials Science +14

Reactive Ion Etching of Benzocyclobutene Using a Silicon Nitride Dielectric Etch Mask

M. Schier · Journal of The Electrochemical Society · 1995 · 24 citations

Natural Sciences, Materials Engineering, Materials Science +16

Etching of sub-micron high aspect ratio holes in oxides and polymers

R. Boucher · Microelectronic Engineering · 2004 · 13 citations

Engineering, Materials Engineering, Materials Science +12