Concepedia

Etching Masks

"Etching Mask" is a thin, patterned layer of material applied to a substrate in microfabrication processes to selectively protect underlying regions from chemical or physical etching, thereby defining the geometry of microscale features in BioMEMS devices.

383

Publications

12K

Citations

1.6K

Authors

381

Institutions

Publications per year

2017–2026

44

Parents

Publications

383

The etching of silicon with XeF2 vapor

Harold F. Winters, J. W. Coburn · Applied Physics Letters · 1979 · 303 citations

, , +17

A fast prototyping process for fabrication of microfluidic systems on soda-lime glass

Che‐Hsin Lin, Gwo‐Bin Lee, Yen‐Heng Lin et al. · Journal of Micromechanics and Microengineering · 2001 · 270 citations

, , +17

Dry etching of polydimethylsiloxane for microfluidic systems

John Garra, Teng Long, J. F. Currie et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 183 citations

, , +17

Patterning of highly oriented pyrolytic graphite by oxygen plasma etching

Xuekun Lu, Hui Huang, N. Nemchuk et al. · Applied Physics Letters · 1999 · 180 citations

, , +15

A new masking technology for deep glass etching and its microfluidic application

Minqiang Bu, Tracy Melvin, G J Ensell et al. · Sensors and Actuators A Physical · 2004 · 168 citations

, , +15

1–5 of 383

Authors

1.6K

  1. HA
    Hidetaka Asoh

    Kogakuin University, Japan

    5 publications · 108 citations

    5

    h-index

  2. SO
    Sachiko Ono

    Kogakuin University, Japan

    5 publications · 108 citations

    5

    h-index

  3. SF
    Sami Franssila

    Aalto University, Finland

    5 publications · 348 citations

    5

    h-index

  4. CI
    Ciprian Iliescu

    Institute of Bioengineering and Nanotechnology, Singapore

    4 publications · 215 citations

    4

    h-index

  5. SJ
    S. J. Pearton

    University of Florida, United States

    4 publications · 65 citations

    4

    h-index

1–5 of 1.6K

Institutions

381

  1. AT&T (United States)

    Bedminster, United States

    10 h-index

    39 publications

    735 citations

  2. The University of Tokyo

    Tokyo, Japan

    10 h-index

    30 publications

    1K citations

  3. Centre National de la Recherche Scientifique

    Paris, France

    9 h-index

    42 publications

    716 citations

  4. National University of Singapore

    Singapore, Singapore

    7 h-index

    13 publications

    442 citations

  5. Lawrence Berkeley National Laboratory

    Berkeley, United States

    7 h-index

    24 publications

    885 citations

  6. Chinese Academy of Sciences

    Beijing, China

    7 h-index

    28 publications

    614 citations

  7. California Institute of Technology

    Pasadena, United States

    7 h-index

    15 publications

    767 citations

  8. University of Twente

    Enschede, The Netherlands

    6 h-index

    28 publications

    1.5K citations

1–8 of 381

Venues

  1. Journal of Micromechanics and Microengineering

    JMM · 32 publications · 1.5K citations

    24

    h-index

  2. 17

    h-index

  3. Applied Physics Letters

    20 publications · 1.1K citations

    17

    h-index

  4. Journal of The Electrochemical Society

    JES · 24 publications · 664 citations

    15

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 24 publications · 500 citations

    14

    h-index

1–5