F. Emmi

Plasma etching of organic materials. I. Polyimide in O2–CF4

Frank D. Egitto, F. Emmi, R. S. Horwath et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1985 · 132 citations

Natural Sciences, Materials Engineering, Materials Science +17

Relation of polymer structure to plasma etching behavior: Role of atomic fluorine

Stephen R. Cain, Frank D. Egitto, F. Emmi · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 70 citations

Natural Sciences, Materials Engineering, Materials Science +17

Plasma etching of organic materials. II. Polyimide etching and passivation downstream of an O2–CF4–Ar microwave plasma

V. Vukanović, G. A. Takacs, Edward Matuszak et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +16

Surface composition and distribution of fluorine in plasma-fluorinated polyimide

L. J. Matienzo, F. Emmi, Frank D. Egitto et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +17

Interactions of high-energy ion beams with polyimide films

L. J. Matienzo, F. Emmi, Daniel C. Hart et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 26 citations

Natural Sciences, Chemistry, Materials Science +17