Concepedia

Etch Masks

Etch Masks is a patterned layer of material used in microfabrication processes to selectively protect underlying regions of a substrate from chemical or physical etching, thereby enabling the transfer of defined geometric features into the substrate with high spatial precision.

387

Publications

13.4K

Citations

1.6K

Authors

382

Institutions

Publications per year

2017–2026

36

Parents

Publications

387

Low-temperature reactive ion etching and microwave plasma etching of silicon

S. Tachi, Kazunori Tsujimoto, Sadayuki Okudaira · Applied Physics Letters · 1988 · 333 citations

, , +16

Fabrication of nanopillars by nanosphere lithography

Chin Li Cheung, Rebecca J. Nikolić, C. E. Reinhardt et al. · Nanotechnology · 2006 · 304 citations

, , +17

A fast prototyping process for fabrication of microfluidic systems on soda-lime glass

Che‐Hsin Lin, Gwo‐Bin Lee, Yen‐Heng Lin et al. · Journal of Micromechanics and Microengineering · 2001 · 270 citations

, , +17

Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis

Yu‐Chih Tseng, Qing Peng, Leonidas E. Ocola et al. · The Journal of Physical Chemistry C · 2011 · 197 citations

, , +17

Fabrication of nanometer-scale side-gated silicon field effect transistors with an atomic force microscope

P. M. Campbell, E. S. Snow, P. J. McMarr · Applied Physics Letters · 1995 · 184 citations

, , +17

1–5 of 387

Authors

1.6K

  1. AS
    Axel Scherer

    California Institute of Technology, United States

    7 publications · 331 citations

    7

    h-index

  2. SF
    Sami Franssila

    Aalto University, Finland

    4 publications · 283 citations

    4

    h-index

  3. FL
    Florian Letzkus

    Institut für Mikroelektronik Stuttgart, Germany

    4 publications · 88 citations

    4

    h-index

  4. SJ
    S. J. Pearton

    University of Florida, United States

    4 publications · 78 citations

    4

    h-index

  5. MD
    Michael David Henry

    Sandia National Laboratories, United States

    4 publications · 211 citations

    4

    h-index

1–5 of 1.6K

Institutions

382

  1. AT&T (United States)

    Bedminster, United States

    11 h-index

    41 publications

    1K citations

  2. Massachusetts Institute of Technology

    Cambridge, United States

    9 h-index

    17 publications

    390 citations

  3. Samsung (South Korea)

    Seoul, South Korea

    9 h-index

    41 publications

    1.5K citations

  4. University of Twente

    Enschede, The Netherlands

    8 h-index

    35 publications

    1.6K citations

  5. United States Naval Research Laboratory

    Washington, United States

    7 h-index

    34 publications

    1.8K citations

  6. University of California, Berkeley

    Berkeley, United States

    6 h-index

    15 publications

    457 citations

  7. The University of Tokyo

    Tokyo, Japan

    6 h-index

    20 publications

    624 citations

  8. Chinese Academy of Sciences

    Beijing, China

    6 h-index

    34 publications

    977 citations

1–8 of 382

Venues

  1. Applied Physics Letters

    38 publications · 1.8K citations

    23

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 26 publications · 1.5K citations

    21

    h-index

  3. 21

    h-index

  4. 14

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 18 publications · 528 citations

    14

    h-index

1–5